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Synthesis of Cerium Dioxide High-k Thin Films as a Gate Dielectric in MOS Capacitor

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Academic year: 2017

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Fig. 2 – XRD spectra of deposited CeO 2  film  3.4   Capacitance-Voltage (C-V) characteristics
Fig. 5  – Variation  of  dielectric  constant  with  measurement  frequency

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