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Origin, State of the Art

and Some Prospets of the Diamond CVD

Boris V. Spitsyn, LeonidL. Bouilov,Alexander E. Alexenko

Institute ofPhysialChemistry,RussianAademyofSienes,

31LeninskyProspekt,117915 Mosow,Russia

Reeived6May,2000

AshortreviewonthediamondCVDorigin,togetherwithitsstateoftheartandsomeprospets

wasgiven. NewhybridmethodsofthediamondCVDpermittogain1.2to6timesofgrowthratein

omparisonwithordinarydiamondCVD's.Reentresultsonn-typediamondlmsynthesisthrough

phosphorusdopingintheourseoftheCVDproessarebrieydisussed. Inomparisonwith

high-pressurediamondsynthesis,theCVDproessesopennewfaetsofthediamondasultimaterystal

for siene and tehnology evolution. It was stressed that, mainly on the basis ofnew CVDs of

diamond, the properties of naturaldiamond are not only reprodued, butanbesurpassed. As

examples,mehanial(fratureresistane),physial(thermalondutivity),andhemial(oxidation

stability)propertiesarementioned. Somepresentissuesintheeldareonsidered.

I Introdution

Diamonds for longtime attratedspeial attention of

men due to unsurpassed hardness and noble

appear-ane produedby reeted andrefrated lightbeams.

Now it is widely known that the diamond, being one

of therystalline phasesof purearbon, hasan

exlu-siveombinationof mehanial,physial and hemial

properties. Fromthelist we shallnote, extremely low

ompressibility,enormous thermalondutivity,

exel-lent radiativeresistane,and also highhemial

inert-ness. Together with many other individual properties

and,inpartiular,ontheirtotality[1℄diamondfar

sur-passes any known material. Therefore itoupies the

highestlevelintheirhierarhy,andanbetermedasa

uniquesupermaterial.

Theplurality ofexlusiveproperties ofdiamondis

aused, onthe onehand,bythe presene in its

stru-ture of short and strong ovalent hemial bonds

be-tween arbon atoms, with onsiderable radialand

an-gularrigidity. Itisindeedtheoriginalreasonofextreme

mehanial and physial harateristis and hemial

stability of diamond. On the other hand, the rather

low nulear hargeof arbon atom, together with the

abovementioned bondsstrongness, auseshigh

radia-tiveresistaneofdiamond,by2-3 ordersofmagnitude

exeedingtheradiativeresistaneofsilion.

However,thewideuseofspei propertiesof

dia-mond, and their ombinations in sienti and

indus-trialpratiewererestritedbothbylimitationsof

nat-uralresouresofdiamondandspeiityoftraditional

diamondsoures:

-naturaldeposits.

-synthesisatstatihighpressureandtemperature.

- synthesisat dynami high pressureand

tempera-ture(explosiveand detonationmethods). Inexplosive

proessdesignedbyDuPont(1970),thedurationofthe

explosion,reatinghighpressureandtemperature,was

1ms, and size ofrystalgrains of diamondamounts

1-50m. Indetonationproessdisoveredinthe

eight-ies by the Russian researhers, the duration and size

areequalto0.3s4nm,respetively.

- synthesis from a gas phase in the onditions of

thermodynamimetastability ofdiamond atlow

pres-sures.

This review will be devoted to the last method of

synthesis,whihafter apioneeringpubliation [2℄,has

beenstudied and developed worldwideduring thelast

eighteenyears.

II From the analysis to the

synthesis

The synthesis of diamond beame possible only after

theestablishmentof its hemial omposition and

de-terminationofarystallinestruture. Itisremarkable,

however, that even before of the qualitative analysis

of diamond arried out by A.Lavoisier (Frane) and

itsquantitativeanalysisperformedbyS.Tennant

(Eng-land), the Russian sientist M.V. Lomonosov in 1762

(2)

minerals. Thoughto Lomonosovdidnotknowneither

thehemialompositionofdiamondnoritsrystalline

struture,his ideahasappearedasprophetial.

Forthemodernhemistries,physiohemistriesand

physiists,highlysuggestiveinthesearhofalternative

inroadstothediamondsynthesiswasthehemial

on-stitution ofthe diamond. Thestruture of latter

rep-resents huge moleuleonstruted from atoms of

ar-bon,onnetedwitheahotherbyovalentsp 3

-bonds.

Thoughthis struturalstateisnotthermodynamially

stable, there were not some prohibitions for trials of

its hemial synthesis. In organi hemistry, for

ex-ample, synthesis of not absolutely stable moleules is

rather a rule, than an exeption. The diamond,

be-ing metastable under usual onditions in relation to

graphite, onserveits own struture at pressurelose

andbelow1atmandtemperatureuptoandmorethan

1000 o

C, depending on the nature of surrounding gas

medium. Inultra-highvauumorin anatmosphereof

ultra-pure hydrogen thediamond retain the struture

of surfae layer idential to the bulk up to

tempera-turesintherangeof1300-1400 o

C[3℄. Thereforeould

arise theideato takeadvantageofthis relative

stabil-ityofdiamondforitssynthesisat theexpensesofnew

arbonatoms. Itwas supposed that,under theation

of diretional ativity of surfaefores, the bonds

be-tween the atoms at the diamond surfae and arbon

atomsfromdeomposingarbonaeoussubstaneswill

rebuild diamond,if exlusively sp 3

-bonding formation

wasprovided. Thus,itwasrequiredto ndonditions

at whih mainly and with high enoughrate only sp 3

-type arbon-arbon bonds are formed and the

forma-tion of other typesof bonding betweenarbon atoms

at the surfae of growing diamondare ompletely

ex-luded. Suhmethodsofhemialsynthesisorhemial

vapordeposition (CVD)ofdiamondwereproposed

al-mostsimultaneouslyin Russia(USSR) and in USAin

the seond half of the fties of now expired last

en-tury. As moleules-arriersof arbonatomsit was

of-feredmethaneanditsleaststablederivative,like

tetra-bromomethane and tetraiodomethane, simple organi

methyl- ontainedmoleules and arbon monoxide

[4-6℄. Thetypialdeomposition temperature wasequal

to900-1100 o

Candthepressurerangedfrompartsof

Torrupto 100atm.

Proesses[4-6℄ demonstrate, for therst time, the

opportunity to grow an artiial diamond by nearly

isothermal pyrolisis of simple arbon-ontained

sub-stanes. However, the mentioned above hemial

in-ertnessof diamonddidnotpromotewellenough

ee-tivity. The rst proesses [4-6℄ were haraterized by

lowgrowthrateofnewdiamond,1nm/h,anddidnot

haveseletivity;togetherwithdiamonddeposition,

en-tersofgraphiteandothernondiamondstatesofarbon

arose,andthroughtheirpropagationdiamondregrowth

eased andnally stopped. Besides, theoriginally

of-seed rystals orhighly disperse diamondpowders. In

the rst open publiation on the diamond CVD, the

deposition of nondiamond arbon was delared as

in-evitable [7℄, though, at that time, the results about

depositionofsubmirometerandmirometerthik

dia-mondlms(DF)withouto-depositionofnondesirable

graphite(see SetionIV) inamodeofhemial

trans-port[8-10℄,andalsowiththegas-transportingset-up

[11,12℄werenotpublishedyet.

Asthebodyofthepubliationisthesynthesisof

di-amond asmetastable phaseofarbon,it isreasonable

toonsidertheenergetiofthebasispeiesofarbon.

III Energeti of the basi

arbon speies

Energeti of aseries of solid arbon states (diamond,

arbines, graphite, monoplaneof graphite - graphene,

amorphous tetrahedral arbon, fullerene C-60 and

single-wall arbon nanotubesof aminimumdiameter)

and gaseousarbon(atom in the groundand rst

ex-ited state)in simpliedonsideration,i.e. takinginto

aountonlystandardenthalpyof formation(pressure

-1atm,temperature-298 o

(3)

TheanalysisofFig. 1allowsonetomakethe

follow-ing basionlusions. First, theenthalpydierene of

diamondandgraphiteisratherlow,inomparisonthe

values for C-60 and arbon nanotubes. Seondly, the

physialondensation ofarbonatom from itsground

eletronistate,inwhihitisdivalent,mostlikelylead

to formationof nondiamond-likephase, but

graphite-like arbon phase (as points arrow 1). On the other

hand, in the ase of arbon atom being in

eletroni-allyexited(tetravalent)state,theirondensationina

solidarbonlmwithmainlytetrahedraloordination

ofatomswillbepreferablyformed,withtheformation

oftheso-alledtetrahedralordiamond-likeamorphous

arbon(arrow2inFig. 1). Itispossibletogetdiamond

arbonwithtetrahedraloordinationofatomsnotonly

in rst,butalsoin seondandin thesubsequent

oor-dinationspheres. Oneofthemandatoryonditionsfor

suhperfetvolumetrirystallizationshouldberather

lowsupersaturationoftheproess. Butinitialproesses

of the CVD suer of extremelylowgrowthrates even

at highsupersaturation.

IV Searh of systems for rapid

rystallization of diamond

from vapor

Nevertheless, one of the authors (B. V. S.) deide to

onentrateattentiononoveromingat leastof oneof

the above-stated drawbaks of the primary diamond

CVD's - extremely low linear growth rate, amounted

only 1 nm/h. It was reasonable to expet quik

diamond growth in systems in whih it is possible to

implement aprompt ething of diamond. Apparently,

the growthrate should be of thesameorder orbelow

the value of the ething rate. In the sixties, it was

not known of promptproesses ofething diamondin

gaseous media, exept for inammability of diamond

in pureoxygen, whih beginsat 850 o

C.However,this

proessompletely shifted to oxidizing produts- CO

andCO

2

,andannotbemadereversible.

Inthe beginning of 1965the Gulbransen's and

o-authors paper[13℄,hasappeared. Itwasshownbythe

authorsthattheethingofgraphiteinpurehydrogenat

pressureofsomeTorrattemperature1650 o

Cproeeds

withrateof2.4mm/day.

Atthatpointaroseanideaonuseofyieldsof

high-temperature interation of graphite with hydrogen as

rystallizingmedium fordiamondupsaling. Theseed

rystal of diamond with temperature about 1000 o

C,

wasplaedneargraphiteheated upto 2000 o

C, at

hy-drogenpressureof12Torr. Ontotheseedrystalof

di-amond, adeposit of whiteondensedarbonis found,

that has allowed to state that a transport of arbon

fromgraphiteondiamondwithpartiipationofatomi

B.V.SpitsynandA.V.Lavrent'ev. As farbakas

O-tober,1966theydemonstrateforthersttimethe

epi-taxialDF regrowthonnatural(111) fae with rate of

1m/h.Theset-upoftheexperimentisshowninFig.

2. Remarkably, that at long-termed experiments the

DFthiknessouldbeabout10mandmore,without

formationofanytraesofgraphitein theomposition

ofthelm. Suhabseneofthegraphiteo-deposition

allowed for the rst time to study kinetis of

rystal-lization,forexample,dependeneofDFgrowthratevs.

temperature[11℄. Thebasimehanismofthehemial

transportwasestablished:

Graphite (2000 o

C)+(H

2

,H)!C

2 H

2 !

diamond( 1000 o

C)+H

2

: (1)

Atprolongedarryingouttheproess(1),ethingof

thegraphiteholder(Fig. 2)ofdiamondseedrystalwas

observed. Quantitativelyto explore thisphenomenon,

onaplaeofseedrystalofdiamond(Fig. 2),aplateof

isotropiarbonwithdensityof2.06g/m 3

wasplaed.

Inratherwidetemperaturerange- from800 o

Cupto

1300 o

Cgraphitewassubjetedtoethingin thesame

onditions,in what DF growthourred. Theething

rateofthegraphiteplaterisewithtemperature

lower-ing and beame equal to 6 m/h at 800 o

C [14℄. In

the Fig. 3, the kinetis of DF growth and graphite

interation with a gaseous phase with a nearly

iden-tial omposition at 60 Torr is plotted. One an see

thatthereisaratherwiderangeinwhihthediamond

growthispossibleandgraphitegrowth(and,obviously,

itself-nuleation)isimpossible. It isenlighteningthat

the`solubility'(attotalpressure=76Torr)ofarbon

inthegasphase,[C℄/[C℄+[H℄,presentedintheFig. 3,

passesthroughaminimum,whihposition,however,is

farfromthemaximumofthegrowthrateofadiamond

lm.

Figure 2. General set-up of HGCTR. Afterequilibration

at T1 inH2 at 12 Torr, C2H2, H and H2 are transported

by diusion to the diamond seed surfae and at T

(4)

Figure3. DFgrowth rate,V

d

(triangles), andgraphite

in-terationrate,Vgr (irles),vs. substratetemperature,T2,

undernearly identialonditionsofthehemialtransport

reation(T1=2000 o

C,h=1mm,Ptot=60 Tor). Dottedline

presentsC/C+H ratio inthevapor phaseatit total

pres-sure,Ptot=76 Tor.

During less than two deades the ativated CVD

was widely disseminated, improved and are explored

in hundredsoflaboratoriesof alltehniallyadvaned

ountriesoftheworld. Inthebaseofmodernativated

CVD ofdiamond[15,16℄,there arefourbasimethods

ofgasphaseativation:

-thermal,

-eletrial (DC,RFandmWdisharges),

-hemial,

-photohemial.

ThepluralityoftheCVD'sandativated CVD'sis

demonstratedinFig. 4.

Amongtheativated CVD methods, the most

dis-seminatedare

V Plasma hemial methods of

diamond synthesis

For plasma-hemialdiamond synthesis (PDS) nearly

anyoftheknownlowtemperatureplasmareatorsan

beused. Thegasphaseontainsinitiallyhydroarbons

in mixture with hydrogen, and also various

ombina-tions of intermixtures CO, CO

2 , H

2 O, H

2

, simple

or-gani ompounds (alohols, et.), and

halogenohydro-arbons. It was exposed to a heating and

simultane-ouslyonversionin various kindsof eletridisharge.

AnalprodutPDSis,dependingonplasmaonditions

and substrate nature, singlerystal orpolyrystalline

DF. However ontrarily to preipitation of so named

diamond-likearbon,atPDSapurediamond,withthe

ontentofarbonatomsinsp 3

eletronistate,loseto

100% wasahieved. As aresult, themirosopi and

marosopi properties of synthesized diamond

(hard-ness, thermal ondutivity, et.) are nearly idential

of thepropertiesof naturaldiamond. High seletivity

(noo-depositionofanykindofsolidarbon,exeptof

diamond) ofthePDS isaused byaonsiderable

on-entrationoffreeradials: H,O,OH,et. intheplasma

volume. Theirpreseneprovidesapreferredethingof

any nondiamond arbons. Atomi hydrogen beome

not onlyakeysubstane forsmoothitsown diamond

surfaeregrowth,butinthespontaneousself-nuleation

ofdiamondonnondiamondsubstrates(metals,oxides,

arbides,nitrideset.).

Asastartinggaseousmixture(0.5-5)%CH

4 inH

2

willusuallybeutilized,atpressureintherangeoftens

andhundredsTorr.Afterstartinginthemixtureofan

eletri disharge, the onversion of stable moleules

CH

4

into neutralandhargedhydroarbonaeous

par-tiles: C 2 H 2 , C 2 H 4 , CH 3 , C 2 H, CH 2 , C 2 , CH + , CH + 2 ,

et. proeeds. Theonsiderablefration (fromseveral

%upto90%)ofH

2

moleulesdissoiatestoHatoms,

andalsotoionsH +

,H +

3

,H . Theplasmaionization

de-greein the majorityof theplasmareatorsis 10 7

.

The DF rystallization temperature usually is 700 to

900 o

C, and the average temperatureof the ativated

gas phase is muh higher (from 2000 up to 5000 o

C).

CrystallizingmediumatPDSis,asarule,lassiedas

lowtemperature nonequilibrium plasma. Most widely

for PDS thefollowingkindsof dishargesare applied:

adireturrentanditsupdating(ar-jet),RF

(prefer-ably,indution),mirowave,andECR.

Inomparisonwithaglowdisharge,thed-eletri

ar(DCEA)hasthreeessentialpeuliarities: high

pres-sure of a gaseous disharge, usually tens and

hun-dreds Torr, onsiderably smaller gap between

ele-trons andheavypartilestemperature(nearly

isother-malplasma),andhighonentrationsofatomi

hydro-gen and hydroarbon partiles ensuring onsiderable

growthratesofdiamond.

DCEA belongs to stationary self-sustained

dis-hargesoperatingatvoltagefrom50toseveral

hun-dreds Volts. The mosttypial pressureof gas - upto

hundreds of Torr, and urrentdensity on the anode

-up to several A.m 2

. The athode is made of

high-melting metals ortheir arbides (W, Ta). The anode

usuallyservedastheholderofsubstratesforDF

depo-sition. Inthelatterase,beauseofthehighdieletri

propertiesofdiamonddownto1000 o

C,problemswith

homogeneityofdishargeneartothesurfaeofgrowing

DFours. Theyanbesolvedbyvariousmethods,in

partiular, by arrangement of a substrate for DF

re-growthimmediatelybehindtheperforatedanode[17℄.

Reators for DCEA an operate with `hot' [18,19℄

and `warm' [20℄ athode, with athode to anode ratio

of the areasof << 1and >1,respetively. Tungsten

ortantalumarbidesare themostappropriate

materi-alsfor`hot'athode. Typialathodetemperaturedoes

notexeeds 2500 o

Candannotbeessentiallyboosted

withouthazardofquiksputteringof theathode

(5)
(6)

Molybdenum usually serves as the warm athode

(800-1200 o

C).ThestabilityofdishargeatDCEA

pro-vided with a ballast resistor, or by ative eletroni

ontroller. Theseondaryion-eletroni emission may

ontainappreiablefrationofeletronsesapingfrom

`hot'athode. Alsotheemissionshouldbedominating

in theaseof the`warm'athode. Itresultsthat`hot'

athode DCEA provides (in omparison with `warm'

athodeDCEA)DFwithhigherquality,ontheareaof

1m

2

. Alsoareknownmulti-athodesystems(with

several parallel hot athodes) allowing produing the

DFontheareaofsomeentimeterssquare.

Thesimpliityandrelativeheapnessofdesignand

operation is harateristifor DCEA.The yield of

di-amond in relation to arbon-ontained gas ow may

amountupto30%.

Some diÆulties desribed abovewith the DCEA,

maybe anelled in diret urrentplasmatron (DCP)

[21℄.

InDCP,thelow-voltageeletrialarisignited

be-tweenoaxiallyloatedthoriatedtungstenathodeand

water-ooledopperanode. Asplasma-forminggas,the

mixtureofArwith20%H

2

,andarbon-ontainedgas

(methane) is served. The owveloityis in the range

of1-10km/s[22℄. Remotedfromdishargegapplasma

torh direted to water-ooledsubstrate, e.g.

molyb-denum. The average temperatureof plasmanear to a

growingDFsurfaeis900-1900 o

C.Highlineargrowth

rateofDF in DCP(up to 1mm/hand 0.2mm/h,for

polyrystallineandsinglerystalDF,respetively)and

onsiderable transformation of arbon of a gas phase

intosynthetidiamond(upto8%)makeDCPsuitable

fortheCVDdiamondprodutioninommerialsale.

InthePDS,thetwoRF-dishargemodesanbe

uti-lized: apaitive(RFC)andindutive(RFI)one. The

rstpositiveresultsonPDSwereahievedinRFC

dis-hargeraisedwithuseoffrequeniesfrom100Hzto10

MHzinhydroarbon-hydrogengasphasesatpressure

0.08-15Torr [23℄. Various RFC versions inluding

su-perimposition onplasma of an exteriormagneti eld

are tested for overingby DF largesurfaearea.

Ob-tainedsubmirorystallineDF,asarule,ontainssome

nondiamondarbonphases. However,likewasreently

demonstrated[24℄,RFCprovidesnanosizegrainedDF

with97%ofdiamondphaseontent,highlyompatible

withmediineaimedboneprosthesis.

RFI disharges being eletrodeless, allows,

basi-ally,avoidingpollutionbyeletrodeimpuritiesinboth

plasmaandgrowingDF.Theimpuritysupplyfromthe

wallsofareativevesselanbereduedbytheir

ush-ing bythegas owthat hasbeennotinvolvedin

RF-disharge[25℄. Theahieved growth rate of

polyrys-tallineDF inthe40kWRFI-dishargeis30m/h. At

a substrate diameter of 100 mm diamond CVD goes

withprodutivityupto 5arat/h[26℄.

The mirowavedisharge is also eletrodeless and

anbearriedoutinareatorwithquartz[27℄orooled

metal wall [28℄. On the basis of disharges with

fre-queny of 2.45 and 0.915 GHz, an industrial

produ-tionof PDSreatorswithworking areaupto 100mm

diameterandmoreanbeorganized. However,apital

rates onprodutionof the reatorsand working osts

(replaementofmagnetrons,et.) arehigh. Therefore,

forsomeofthepratialpurposesthePDSin reators

withDCEAandDCPanbepreferable.

The plasma gained in a mode of an eletroni

y-lotron resonane (ECR) [29℄, essentially diers from

allbeforesurveyed. Themotionoftheaelerated

ele-trons inamagnetield witharesonantfrequeny

al-lowspressureofgas(H

2

plusCH

4

)offrationofTorrto

ahieveionization degree lose to 100%. Aordingly,

energyof heavypartilesanreahsomeeV.It allows

to reeive DF well adhering to surfae of metals and

dieletrisevenattemperaturedownto200-300 o

C.

Only restrited number of publiations reporting

the useof laser plasma [30℄ show, that,despite of

ap-parentexpensivenessofthismethod,itangiveunique

opportunitiesatPDS,forexamplebythedepositionof

ultra-thinDF onasurfaeofpolymers.

Inplasma enhaned CVD's morethan one

ativa-tionation towardsto gasphaseandgrowingDF

sur-fae have been existed. Together with eletrial and

thermal ativation the UV radiations ation typially

takeplae.

VI Hybrid methods of the

diamond CVD

Itisinterestingtoknowmoreaboutintentional

apply-ing o-ation of dierent ativation modes to the

dia-mondCVD's insonamedhybriddiamondCVD

meth-ods[31℄.

TheCVDeÆieny(e.g. DFgrowthrate)is

propor-tionaltotheenergyinput. However,inaseriesofases,

an intentional introdued auxiliaryativation into the

diamondCVDsystemproduedmuhmoreeetthen

asimplesuperpositionofativationations. At

supple-mentaryenergyontributionof0.01-10%inrelationto

thebasione,thegrowthrateaninrease1.2-6times

[32-34℄. TheDFqualityinaseriesofasesisnot

wors-ened(Fig. 5).

Depending on theharater and the diretionality

ofationonthesystem`rystallizationmedium-

rys-tal', two opportunities an be surveyed: ation on a

gasphase(homogeneous)andonasurfaeofagrowing

rystal(heterogeneoushemialreations).

Onemayspeulateabouthowtheextraativation

inuene the basiproesses of the diamondCVD. It

shouldbementionedthefollowing,probablynotan

ex-haustivelist,ofspeiresponseoftheCVDsystemto

additionalativation:

-partiipationinformationofsolidarboninsome

(7)

exitedmoleulesofaetylene[35,38℄andother

hydro-arbonmoleulesandpartiles,havinghigh reativity;

- partiipation of adsorbed hydrogen atoms

dur-ing formation of diamond nulei (the adsorption of

moleules of aetylene anbe arriedout ontwonext

enters,oneofwhihisfree,andanotherisengagedin

atom ofhydrogen[39-41℄);

-anirradiationofasurfaebyeletronsandquanta,

that resultstohargingofadsorbedmoleules[42,43℄,

to enhanement of a surfae diusion [44, 45℄ and/or

hydrogendesorption rate[33℄.

All above fators may inuene nuleation and

growthrateof diamondanditsquality. However

har-aterandmeasureoftheinuene,isunonditional,

de-pend on thelevelof additional ativation, nature and

onentrationofarbonpreursors,substrate

tempera-tureandotherparametersoftheproess.

Anotherimportantpoint-depositionofsolidphases

(diamond andnotdiamondarbon)andtheir

gasia-tion in diamond CVD's, proeed on dierent routes.

That is whysimultaneoususe ofseveralenergymodes

allows to inuene almost independent as DF growth

rate, and onseletivityof theproess. Thus, of

inter-estistheintentionalombinationofvariousativations

aimedtolariationoftherystallizationmehanism,

gaininprodutivityofproessandqualityofdiamond

material. Thus, thehybridmethods of hemial

rys-tallizationofdiamondfromativatedgasphaseprovide

hallengingreserveforthediamondCVDeÆieny

rais-ing, andalsofordefetstrutureandimpurity

ompo-sitionontrol ofDF.

Figure 5. SEMimage of the morphologyof DF's ##

14-21, 14-22,and 14-23 grown by HF tehniqueatbiases: a)

0 V (#14-21); b)+70 V (#14-22), )+85 V (#14-23).

Bottom: RamanspetraoftheDFsamples.

VII Doping of diamond lms

Doping of diamond, as well as any other rystal, is

meantastheformationinitofanatomiallydispersive

(true) solid solution,in whih the impurityatoms

o-upysubstitution orinterstitialpositions ofrystalline

lattie. Diamond doping ours or enfored

uninten-tionallyorintentionally. Inthelatterase,

experimen-talistspursue diretional hange of mehanial,

physi-al,orhemialpropertiesofdiamond. Owingtorather

lowdiusivityvalueofthemajorityofimpuritiesin

di-amond, the solid solution an be maintained in wide

temperaturerange. Therefore,thestabilityof optial,

eletrialand otherpropertiesof dopeddiamondhave

provided.

Thenumberofimpuritiesapabletoreplaea

ar-bon atom in alattie of diamond is rather restrited,

owing to small ovalent radius of arbon atom in

di-amondrystalline lattie and very high bond energies

betweenatoms[46℄. However,theadaptationof

impu-ritiesas atrue solidsolution (equilibrium or

nonequi-librium) is a neessary, but not enough ondition for

onversionofdieletridiamondintoadoped

semion-dutor materialwith ahigh level of ondutane. For

providingoflowativationenergyofimpurityrelevant

ondutivity theposition of additional energylevelin

forbiddenband-gapshoulddefendnottoofar,nomore

than approximately 0.5 eV, from the top of valene

band(holesemiondutor)and,aordingly,from

bot-tomofondution band(eletronsemiondutor).

Apparently, CVD methods of rystallizationof

di-amond provide more favorable opportunities for

dop-ing diamond than high pressure - high temperature

method. Atually lose to room temperature

(tem-perature on an inlet in CVD reator) pratially any

hemialelementanbefoundinformofhemial

om-pound, orevenin thepure state[47℄. It looks likeby

ativatedCVDsomeextraopportunitiesbothfor

equi-librium and, probably, nonequilibrium DF doping in

theourseoftheirgrowthmightbeappeared. Anyway,

dopingDFbyhydrogen[48,49℄,andbyboron,

phospho-rusandsulfur[50℄wasahievedinahemialtransport

reationmode,dopingbyhydrogeninthehot-lament

reator [51,52℄, by phosphorus in isothermal diamond

CVD[53℄andinmW-disharge[54℄,andalsobysulfur

-intheMWACVD[55℄.

Hydrogen is ustomary onstituent of vaporphase

inmanymethodsofativatedCVDofdiamond. Thatis

whyitisfrequentlyabakgroundimpurityinthedoped

DF. Thehydrogenis onsideredasaneutralimpurity

indiamond. However,itaninteratwithother

impu-rityatoms,thushangingtheireÆienyaseletrially

ative impurity [56℄. Aording to ref. 52 hydrogen

inpolyrystallineDF anenterin onentrationsfrom

0.02 up to 0.2 at.%, with redution of rystallization

(8)

Now there are many publiations [57℄ on epitaxial

DF doping by boron, with obtaining of

semiondu-tor lm with p-type ondutivity. The hole mobility

reahes1590m 2

/V.s[58℄,thatislosetohole's

mobil-ityinnaturalsemiondutordiamondoftheIIbtype.

Then-typediamondsemiondutorisnotfoundin

Nature. The attempts of its high-pressure synthesis

andalsousingthemethodofionimplantationhavenot

onludedbyessentialsuess. Onlyinourpubliation

[50℄,werequotedtherstpositiveresultsonthe

synthe-sisofondutiveDF,dopedbyphosphorusandsulfur.

Later persistent and onsistent Japanese researhers

onrmedarealityofregrowthofepitaxialDF, doped

by phosphorus [53, 54℄ and bysulfur [55℄. It isworth

to note that aording to theRutherford

baksatter-ing tehniqueupto 90%of phosphorus atomsreplae

arbon atoms in a diamond lattie [59℄. It supports

ourpreview [47℄,that phosphorus anbeaepted by

diamondlattie. Webasedouronlusiononthe

pro-totypemoleuleapproah. Infat,theovalentradius

offour-oordinatedphosphorusinphosporus-ontained

moleules (tetraalkylphosphonium halogenide) has

lower value than in three-oordinated

phosporus-ontained moleules (trialkylphosphyne). The eet

maybemuhmorepronounedintheweak

phosphorus-in-thediamondsolidsolution. Thereasonouldbeone

of importane forlowstress phosphorus adaptationin

thestateofadilutesolidsolutionindiamondstruture

[47℄.

Reent publiations onrms the formation of

n-typeepitaxialDF, dopedin ourseofgrowthby

phos-phorus. Thesignofahargeofarriers,partiularlyby

theHallmethod,speiestheformationofthediamond

semiondutorwith aneletronitypeofondutivity.

TheHallmobilityofarriersontainedfrom23toabout

1000m 2

/V.s[53,54,60℄.

VIII DF properties

The mehanial harateristis of the vapor-deposited

diamond (elasti modulus, hardness) are lose to the

properties of natural diamond. On other properties,

suh,asresistanetobrittlefailure,thepolyrystalline

plate of diamond obtained by the CVD method an

surpasstheperformaneofnaturaldiamond.

The experiene on the diamond doping (Setion

VII),haveshownthatustomarilyhighlydieletri

dia-mond(10 12

10 14

Ohm.m)an,throughthe

introdu-tionofsmallamountof(<1at.%)boronand

phospho-rusdopant,tobetransformedinasemiondutorwith

RTresistivityof2:10 3

and30hm.m,respetively.

CombinationsoftheCVD andhigh-pressure

meth-ods provide the synthesis of monoisotopi

diamond-C-12 (99.98 % of the C-12 isotope). This rystal

es-sentiallyexeed thethermalondutivitylevelofpure

=98.8:1.2.,by1.5timesat300K.

Theoptialtranspareneofhighlyperfetepitaxial

DFnear fundamentalabsorption edge(about220nm)

anexeedthis quantityfortheIIadiamond.

In whih onerns the resistane against oxidizing

bymeltedpotassiumnitrate,theborondopedepitaxial

DF surpasses by approximately6 times (111) natural

diamonds,onwhihitwasregrown[46℄.

Thus, mainly on thebasis of new CVD's diamond

weareableto statethatthepropertiesofgenuine

dia-mondarerealistinotonlytobereprodued,butexel

seriously.

Atthispoint,ofimportanewillbetohighlightthat

revieweddiamondCVDsandvapor-growndiamondare

preferably not ompetitors to other diamond

synthe-sis methods and diamond soures. They look rather

omplementarymethodsandresouresfortheDiamond

MaterialsSiene. Thepotentialofthisfasinatingarea

in basi terms will be demonstrated in the following

Setions.

IX Heteroepitaxy of wide

band-gap semiondutor on

diamond

Some expetable new results in benets of solid state

eletronis,optoeletronis and lasersanbeahieved

byjoiningdiamondwithotherwideband-gap

semion-dutors(SiC,AlN,GaN,andBN).Oneoftheexamples

ofthisombinationissurfaeaoustiwavesdeviesin

two-layersystem: CVD diamond-polyrystallineAlN

[62℄. The ative aoustoeletroni struture was

re-atedbyombinationofd-dishargeandRFmagnetron

sputteringforDFandAlNlm,respetively.

Other stepsin hybridstrutures may promote the

demonstrated reently [63℄ heteroepitaxial AlN lm

deposition on nearly (111) fae of natural diamond.

The proess take plae by monopreursor substane,

NH

4 AlBr

4

,thermaldeompositionintheultra-pureAr

owat 900 o

C.

X Appliation of the CVD

diamondmethods and the

va-por grown diamond

In many ases the eletrodeless diamoned CVD's are

preferable, beause the pollution of DF by impurities

of metals is prevented. However,evenin eletrodeless

methods plasma volume neighbor with walls or

win-dowsmadefromaquartzglass. Thatanresultin the

DF pollution by Si and O impurities. The O and N

(9)

nondiamondarbon. Itontentmaybeminimizedonly

at theexpensesofthegrowthrate.

Disoveredanddevelopedoriginallyin Russia,now

diamondCVD'slookslikemostexiblesynthesis

meth-ods. Being an alternative to the appreiated

high-pressure diamond synthesis, the CVD proesses open

newfaetsofthediamondasultimaterystalforsiene

and tehnologyevolution. Moreover,diamondCVDis

rather not ompetitor to other diamond soures, but

rather the tehnology, providing muh easy

opportu-nity to integer dierent diamond soures (Setion I),

withrealpromisetosynthesizeaboutanydiamondand

diamond-basedompositematerialinsoftonditionsof

diamonds thermodynamimetastability.

Thermal ativation of a gas phase (hot lament

method), diret urrent ar-jet and mirowave

en-haned diamond CVD are most suitable for

ommer-ial use in DF, diamond foil and diamond plates

pro-dution. Theseprodutsndsuessfulappliation as

wear-resistantoatings for instruments, frition pairs,

windows for UV, visible, IR, mW, and X-ray

radia-tion, thermal spreaders and heat-sinks, tensoresistive

and termoresistive sensors, UV- and X-ray detetors,

et.

XI Near future hallenges and

prospets

ThebasiproblemsintheeldofnewCVDmethodsof

diamondsynthesisandinnewdiamondmaterialsareat

dierent stages of theirdevelopmentand solution. In

thenalwehavetonote themostessentialissuesofR

&Dinsieneandtehnologyofvapor-growndiamond:

-studyofthemehanismofthediamondCVD,

-quantitativeexaminationofhybridmethodsof

a-tivated CVDofdiamond,

-anexaminationofeetiveDFdopinginourseof

itsgrowth,

-largearearegrowthofheteroepitaxialDFonheap

singlerystalsofnondiamondnature,and

-ombinationofdiamondandotherwideband-gap

semiondutormaterials(SiC,AlN,GaN,et.) in

two-andmulti-lmstruturesforbenetsofhigh-frequeny

andhigh-powereletronis,optoeletronis,lasers,and

soon.

XII General onlusion

ThediamondCVDandrelatedareasisaratheryoung

eld of R&D, and is still urious, attrative, and

prospetivefor sientistsandengineers. Itprovidesus

bymanyneweetiveappliations,andpromisesusby

many hidden disoveries. It looks obvious, that next

areawill be feasible mainly with interdisiplinary

ap-proahesandwithinternationalooperationinoutlined

fasinatedareaofphysis,hemistryandtehnologies.

Aknowledgments

TheauthorshighlyappreiatedA.A.Botevfor

par-tiipationinexperiments. Wewishtoexpressgratitude

toA.D.AlievforSEM mirographs,andN.N.Mel'nik

andT.N.Zavaritskaya-fortheRamanstudyofthe

di-amondlms. WealsoarethankfultoN.A.Abatourova

and I.V. Galoushko for assistane in preparing of the

manusript. We highly aknowledge partial support

of researh from grantsSandia National Laboratories

(USA)AN-8800,Argonne NationalLaboratory(USA)

951932404,andRBRF(Russia) 98-03-32601.

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Imagem

Figure 2. General set-up of HGCTR. After equilibration
Figure 3. DF growth rate, V
Figure 4. Diamond CVD ies.
Figure 5. SEM image of the morphology of DF's ## 14-

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